CHARVOT, Jaroslav, Daniel POKORNÝ, Raul ZAZPE, Richard KRUMPOLEC, David PAVLIŇÁK, Luděk HROMÁDKO, Jan PŘIKRYL, Jhonatan RODRIGUEZ-PEREIRA, Milan KLIKAR, Veronika JELÍNKOVÁ, Jan M. MACAK a Filip BUREŠ. Cyclic Silylselenides: Convenient Selenium Precursors for Atomic Layer Deposition. ChemPlusChem. Weinheim: Wiley-VCH Verlag, roč. 85, č. 3, s. 576-579. ISSN 2192-6506. doi:10.1002/cplu.202000108. 2020. |
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@article{54561, author = {Charvot, Jaroslav and Pokorný, Daniel and Zazpe, Raul and Krumpolec, Richard and Pavliňák, David and Hromádko, Luděk and Přikryl, Jan and RodriguezandPereira, Jhonatan and Klikar, Milan and Jelínková, Veronika and Macak, Jan M. and Bureš, Filip}, article_location = {Weinheim}, article_number = {3}, doi = {http://dx.doi.org/10.1002/cplu.202000108}, keywords = {atomic layer deposition; molybdenum; nanostructures; selenium; transition metal dichalcogenides}, language = {eng}, issn = {2192-6506}, journal = {ChemPlusChem}, title = {Cyclic Silylselenides: Convenient Selenium Precursors for Atomic Layer Deposition}, url = {https://chemistry-europe.onlinelibrary.wiley.com/doi/abs/10.1002/cplu.202000108}, volume = {85}, year = {2020} }
TY - JOUR ID - 54561 AU - Charvot, Jaroslav - Pokorný, Daniel - Zazpe, Raul - Krumpolec, Richard - Pavliňák, David - Hromádko, Luděk - Přikryl, Jan - Rodriguez-Pereira, Jhonatan - Klikar, Milan - Jelínková, Veronika - Macak, Jan M. - Bureš, Filip PY - 2020 TI - Cyclic Silylselenides: Convenient Selenium Precursors for Atomic Layer Deposition JF - ChemPlusChem VL - 85 IS - 3 SP - 576-579 EP - 576-579 PB - Wiley-VCH Verlag SN - 21926506 KW - atomic layer deposition KW - molybdenum KW - nanostructures KW - selenium KW - transition metal dichalcogenides UR - https://chemistry-europe.onlinelibrary.wiley.com/doi/abs/10.1002/cplu.202000108 L2 - https://chemistry-europe.onlinelibrary.wiley.com/doi/abs/10.1002/cplu.202000108 N2 - Three cyclic silylselenides were prepared in a straightforward manner. Property tuning has been achieved by varying the ring size and the number of embedded selenium atoms. All silylselenides possess improved resistance towards moisture and oxidation as well as high thermal robustness and sufficient volatility with almost zero residues. The six-membered diselenide proved to be particularly superior Se precursors for atomic layer deposition and allowed facile preparation of MoSe2 layers. Their structure and composition have been investigated by Raman and X-ray photoelectron spectroscopy as well as scanning electron microscopy revealing vertically aligned flaky shaped nanosheets. ER -
CHARVOT, Jaroslav, Daniel POKORNÝ, Raul ZAZPE, Richard KRUMPOLEC, David PAVLIŇÁK, Luděk HROMÁDKO, Jan PŘIKRYL, Jhonatan RODRIGUEZ-PEREIRA, Milan KLIKAR, Veronika JELÍNKOVÁ, Jan M. MACAK a Filip BUREŠ. Cyclic Silylselenides: Convenient Selenium Precursors for Atomic Layer Deposition. \textit{ChemPlusChem}. Weinheim: Wiley-VCH Verlag, roč.~85, č.~3, s.~576-579. ISSN~2192-6506. doi:10.1002/cplu.202000108. 2020.
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